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Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition

机译：通过等离子体增强化学气相沉积和等离子体浸没离子注入和沉积获得的非晶态碳质薄膜的光学，机械和表面特性

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Turri Rafael G.; Santos Ricardo M.; Rangel Elidiane C.; da Cruz Nilson C.; Bortoleto José R.R.; Dias da Silva José H.; Antonio César Augusto; Durrant Steven F.;
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1. Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition [J] . Rafael G. Turri, Ricardo M. Santos, Elidiane C. Rangel, Applied Surface Science . 2013,第sepa1期

机译：通过等离子体增强化学气相沉积和等离子体浸没离子注入和沉积获得的非晶态碳质薄膜的光学，机械和表面特性
2. Mechanical and piezoresistive properties of thin silicon films deposited by plasma-enhanced chemical vapor deposition and hot-wire chemical vapor deposition at low substrate temperatures [J] . J. Gaspar, A. Gualdino, B. Lemke, Journal of Applied Physics . 2012,第2期

机译：在低基板温度下通过等离子体增强化学气相沉积和热线化学气相沉积沉积的薄膜的机械和压阻特性
3. Optical properties and chemical bonding characteristics of amorphous SiN _X:H thin films grown by the plasma enhanced chemical vapor deposition method [J] . He Y., Wang Y., Li W., Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2012,第3期

机译：等离子体增强化学气相沉积法生长非晶SiN _X：H薄膜的光学性质和化学键合特性
4. Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition [C] . C. Shim, J. Yang, Y.C. Quan, European conference on chemical vapor deposition . 2001

机译：等离子体功率和沉积压力对等离子体增强化学气相沉积沉积的低介电常数等离子体聚合环己烷薄膜的影响
5. An in situ x-ray photoelectron spectroscopy analysis of thin films created through physical vapor deposition of aluminum and plasma enhanced chemical vapor deposition of trimethylsilane. [D] . Scott, Paul Robert, Jr. 2007

机译：通过铝的物理气相沉积和等离子体增强的三甲基硅烷化学气相沉积产生的薄膜的原位X射线光电子能谱分析。
6. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films [O] . Mateusz Œmietana, Robert Mroczyński, Norbert Kwietniewski 2014

机译：射频等离子体增强化学气相沉积（RF PECVD）反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
7. Diverse Amorphous Carbonaceous Thin Films Obtained by Plasma Enhanced Chemical Vapor Deposition and Plasma Immersion Ion Implantation and Deposition [O] . Santos R.M., Turri R., Rangel E.C., 2012

机译：通过等离子体增强化学气相沉积和等离子体浸没离子注入和沉积获得的多种非晶碳质薄膜

Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition

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